Atomic layer deposition of Cu(i) oxide films using Cu(ii) bis(dimethylamino-2-propoxide) and water.
نویسندگان
چکیده
To grow films of Cu2O, bis-(dimethylamino-2-propoxide)Cu(ii), or Cu(dmap), is used as an atomic layer deposition precursor using only water vapor as a co-reactant. Between 110 and 175 °C, a growth rate of 0.12 ± 0.02 Å per cycle was measured using an in situ quartz crystal microbalance (QCM). X-ray photoelectron spectroscopy (XPS) confirms the growth of metal-oxide films featuring Cu(i).
منابع مشابه
Atomic Layer Deposition of Ultrathin Copper Metal Films from a Liquid Copper(I) Amidinate Precursor
We report a method for producing thin, completely continuous and highly conductive copper films conformally inside very narrow holes with aspect ratios over 35:1 by atomic layer deposition ALD . Pure copper thin films were grown from a novel copper I amidinate precursor, copper I N,N -di-sec-butylacetamidinate, and molecular hydrogen gas as the reducing agent. This copper precursor is a liquid ...
متن کاملEpitaxial growth of Cu ( 100 ) and Pt ( 100 ) thin films on perovskite substrates Andrew
Pulsed laser deposition (PLD) has been used to grow epitaxially oriented thin films of Cu and Pt on (100)-oriented substrates of both SrTiO3 and LaAlO3. The resulting films have been characterized for their crystalline orientations using x-ray diffraction (XRD) and for their surface morphologies using atomic force microscopy (AFM). The diffraction results illustrated that purely epitaxial Cu(10...
متن کامل1 Epitaxial growth of Cu ( 100 ) and Pt ( 100 ) thin
Pulsed laser deposition (PLD) has been used to grow epitaxially oriented thin films of Cu and Pt on (100)-oriented substrates of both SrTiO3 and LaAlO3. The resulting films have been characterized for their crystalline orientations using x-ray diffraction (XRD) and for their surface morphologies using atomic force microscopy (AFM). The diffraction results illustrated that purely epitaxial Cu(10...
متن کاملPolystyrene CuO/Cu2O uniform films inducing MB-degradation under sunlight
This study reports on a Cu-sputtered film on polystyrene (PS) leading to the discoloration/degradation of methylene blue (MB) under low intensity solar simulated irradiation. Direct current magnetron sputtering (DCMS) was used to graft uniform, adhesive Cu/Cu oxides on the polystyrene substrate. The kinetics of Cu-PS mediated MB-discoloration adding H2O2 was observed to take place within 90–120...
متن کاملAtomic Layer Deposition of Tin Oxide with Nitric Oxide as an Oxidant Gas
Atomic layer deposition (ALD) of tin oxide (SnO2) thin films was achieved using a cyclic amide of Sn(II) (1,3-bis(1,1-dimethylethyl)4,5-dimethyl-(4R,5R)-1,3,2-diazastannolidin-2-ylidene) as a tin precursor and nitric oxide (NO) as an oxidant gas. Film properties as a function of growth temperature from 130–250 C were studied. Highly conducting SnO2 films were obtained at 200–250 Cwith the growt...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید
ثبت ناماگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید
ورودعنوان ژورنال:
- Dalton transactions
دوره 46 18 شماره
صفحات -
تاریخ انتشار 2017